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Utilize este identificador para citar ou criar um link para este item: http://acervodigital.unesp.br/handle/11449/128572
Título: 
Sevoflurane induces DNA damage whereas isoflurane leads to higher antioxidative status in anesthetized rats
Autor(es): 
Instituição: 
Universidade Estadual Paulista (UNESP)
ISSN: 
2314-6133
Financiador: 
  • Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
  • Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
Resumo: 
Taking into account that there are controversial antioxidative effects of inhalational anesthetics isoflurane and sevoflurane and absence of comparison of genotoxicity of both anesthetics in animal model, the aim of this study was to compare DNA damage and antioxidant status in Wistar rats exposed to a single time to isoflurane or sevoflurane. The alkaline single-cell gel electrophoresis assay (comet assay) was performed in order to evaluate DNA damage in whole blood cells of control animals (unexposed; n = 6) and those exposed to 2% isoflurane (n = 6) or 4% sevoflurane (n = 6) for 120 min. Plasma antioxidant status was determined by 3( 4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazolium bromide (MTT) assay. There was no statistically significant difference between isoflurane and sevoflurane groups regarding hemodynamic and temperature variables (P > 0.05). Sevoflurane significantly increased DNA damage compared to unexposed animals (P = 0.02). In addition, Wistar rats anesthetized with isoflurane showed higher antioxidative status (MTT) than control group (P = 0.019). There were no significant differences in DNA damage or antioxidant status between isoflurane and sevoflurane groups (P > 0.05). In conclusion, our findings suggest that, in contrast to sevoflurane exposure, isoflurane increases systemic antioxidative status, protecting cells from DNA damage in rats.
Data de publicação: 
1-Jan-2015
Citação: 
Biomed Research International. New York: Hindawi Publishing Corporation, v. 2015, p. 1-6, 2015.
Duração: 
1-6
Publicador: 
Hindawi Publishing Corporation
Fonte: 
http://www.hindawi.com/journals/bmri/2015/264971/
Endereço permanente: 
Direitos de acesso: 
Acesso aberto
Tipo: 
outro
Fonte completa:
http://repositorio.unesp.br/handle/11449/128572
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