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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/32231
Title: 
Soft chemical deposition of BiFeO3 multiferroic thin films
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Georgia Inst Technol
ISSN: 
0003-6951
Abstract: 
BiFeO3 thin films free of secondary phases were obtained by the soft chemical solution on Pt(111)/Ti/SiO2/Si substrates after annealing at 500 degrees C for 2 h. The film grown in the (100) direction presented a remanent polarization P-r of 31 mu C/cm(2) at room temperature. Electrical measurements using both quasistatic hysteresis and pulsed polarization confirm the existence of ferroelectricity with a switched polarization of 60-70 mu C/cm(2), Delta P=(P-*-P). Low leakage conduction and an out-of-plane piezoelectric (d(3)) coefficient of 40 pm/V were obtained by the improvement of preparation technology.
Issue Date: 
29-Jan-2007
Citation: 
Applied Physics Letters. Melville: Amer Inst Physics, v. 90, n. 5, 3 p., 2007.
Time Duration: 
3
Publisher: 
American Institute of Physics (AIP)
Source: 
http://dx.doi.org/10.1063/1.2433027
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/32231
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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