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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25403
Title: 
Ferroelectric characteristics of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by the soft chemical method
Author(s): 
Institution: 
Universidade Estadual Paulista (UNESP)
ISSN: 
0167-577X
Abstract: 
Ferroelectric SrBi4Ti4O15 thin films were successfully prepared on a Pt(111)/Ti/SiO2/Si(100) substrate for the first time by spin coating, using the polymeric precursor method. X-ray diffraction patterns of the films indicate that they are polycrystalline in nature. Atomic force microscopy (AFM) analyses showed that the surface of these films is smooth, dense and crack-free with low surface roughness (6.4 nm). At room temperature and at a frequency of 1 MHz, the dielectric constant and the dissipation factor were, respectively, 150 and 0.022. The C-V characteristics of perovskite thin film prepared at low temperature show normal ferrolectric behaviour. The remanent polarization and coercive field for the films deposited were 5.4 mu C/cm(2) and 8 5 kV/cm, respectively. All the capacitors showed good polarization fatigue characteristics at least up to 1 x 10(10) bipolar pulse cycles indicating that SrBi4Ti4O15 thin films can be a promising material for use in nonvolatile memories. (c) 2005 Elsevier B.V. All rights reserved.
Issue Date: 
1-Jul-2006
Citation: 
Materials Letters. Amsterdam: Elsevier B.V., v. 60, n. 16, p. 2020-2023, 2006.
Time Duration: 
2020-2023
Publisher: 
Elsevier B.V.
Keywords: 
  • thin films
  • atomic force microscopy
  • dielectric properties
  • fatigue
Source: 
http://dx.doi.org/10.1016/j.matlet.2005.12.071
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/25403
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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