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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25572
Title: 
Improvement of fatigue resistance on La modified BiFeO(3) thin films
Author(s): 
Institution: 
  • Universidade Federal de São Carlos (UFSCar)
  • Universidade Estadual Paulista (UNESP)
ISSN: 
1567-1739
Sponsorship: 
  • Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
  • Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
  • Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
Abstract: 
The effect of lanthanum (La) addition in BiFeO(3) (BFO) thin films deposited on Pt(111)/Ti/SiO(2)/Si(100) substrates prepared by soft chemical method was explained. Increasing La concentration promotes changes on structure, microstructure and dielectric/ferroelectric response of films. X-ray diffraction reveals that the films are free of preferred orientations and structural distortion. La addition promotes an increase in dielectric permittivity. The polarization switching and the fatigue behavior of the BFO films were significantly enhanced by the La concentration. (C) 2008 Elsevier B.V. All rights reserved.
Issue Date: 
1-Mar-2009
Citation: 
Current Applied Physics. Amsterdam: Elsevier B.V., v. 9, n. 2, p. 520-523, 2009.
Time Duration: 
520-523
Publisher: 
Elsevier B.V.
Keywords: 
  • Fatigue resistance
  • BiFeO(3)
  • Ferroelectric
  • Multiferroic
Source: 
http://dx.doi.org/10.1016/j.cap.2008.05.001
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/25572
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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