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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25668
Title: 
Effect of niobium dopant on fatigue characteristics of BiFeO3 thin films grown on Pt electrodes
Author(s): 
Institution: 
Universidade Estadual Paulista (UNESP)
ISSN: 
0925-8388
Sponsorship: 
  • Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
  • Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
  • Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
Abstract: 
Pure BiFeO3 (BFO) and Nb-doped (BFN) thin films were fabricated by the soft chemical method. The films were polycrystalline when deposited on Pt/Ti/SiO2/Si substrate and annealed at 500 degrees C for 2 h. X-ray diffraction analysis revealed that the film was fully crystallized. The grain size decreased in the BFN films due the suppression of oxygen vacancy concentration in the BFO lattice. The Nb dopant is effective in improving electrical properties of BFO films. With increase niobium content we obtained thin films free of fatigue up to 10(8) cycles. (C) 2009 Published by Elsevier B.V.
Issue Date: 
24-Jun-2009
Citation: 
Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 479, n. 1-2, p. 274-279, 2009.
Time Duration: 
274-279
Publisher: 
Elsevier B.V. Sa
Keywords: 
  • Ferroelectrics
  • Thin films
  • Chemical synthesis
  • X-ray diffraction
  • Transmission electron microscopy
Source: 
http://dx.doi.org/10.1016/j.jallcom.2009.01.074
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/25668
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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