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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/31673
Title: 
Effect of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering
Author(s): 
Institution: 
  • Lab Nacl Luz Sincrotron
  • Universidade Estadual Paulista (UNESP)
  • Univ Costa Rica
ISSN: 
0168-583X
Abstract: 
We have utilized infra-red and optical absorption measurements, grazing incidence X-ray diffraction (GIXRD) and extended X-ray absorption fine structure (EXAFS) measurements to investigate the influence of hydrogenation on the optical and structural properties of GaAs thin films prepared by rf-magnetron sputtering. Hydrogenation induces distinct changes in the optical properties, namely shifts in the absorption edges and reduction of the Urbach energy. Such modifications are correlated to a reduction in structural disorder as determined by EXAFS and the increase of crystallinity determined by GIXRD. (c) 2005 Elsevier B.V. All rights reserved.
Issue Date: 
1-Aug-2005
Citation: 
Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 238, n. 1-4, p. 329-333, 2005.
Time Duration: 
329-333
Publisher: 
Elsevier B.V.
Keywords: 
  • EXAFS
  • gallium arsenide
  • GaAs
  • sputtering
  • hydrogenation
Source: 
http://dx.doi.org/10.1016/j.nimb.2005.06.071
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/31673
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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