Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

Gelamo, R. V.; Trasferetti, B. C.; Durrant, S. F.; Davanzo, C. U.; Rouxinol, F. P.; Gadioli, G. Z.; Bica de Moraes, M. A.

Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/36217

Title:

Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

Author(s):

Institution:

Universidade Estadual de Campinas (UNICAMP)
Universidade Estadual Paulista (UNESP)

ISSN:

0168-583X

Abstract:

This work illustrates the advantages of using p-polarized radiation at an incidence angle of 70 degrees in contrast to the conventional unpolarized beam at normal (or near-normal) incidence for the infrared spectroscopic study of polycarbosilane, polysilazane and polysiloxane thin films synthesized by plasma enhanced chemical vapor deposition (PECVD) and subsequently irradiated with 170 keV He+ ions at fluences from 1 x 10(14) to 1 x 10(16) cm(-2). Several bands not seen using the conventional mode could be observed in the polarized mode. (c) 2006 Elsevier B.V. All rights reserved.

Issue Date:

1-Aug-2006

Citation:

Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 249, p. 162-166, 2006.

Time Duration:

162-166

Publisher:

Elsevier B.V.

Keywords:

ion irradiation
Si-based polymer film
plasma polymerization
chemical structure
FTIR

Source:

http://dx.doi.org/10.1016/j.nimb.2006.03.105

URI:

Access Rights:

Acesso restrito

Type:

outro

Source:

http://repositorio.unesp.br/handle/11449/36217

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