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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/38329
Title: 
Synthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor method
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Universidade Federal de São Carlos (UFSCar)
ISSN: 
0254-0584
Abstract: 
We report the successful deposition of CaBi2Nb2O9 (CBN) thin films on platinum coated silicon substrates by polymeric precursor method. The CBN thin films exhibited good structural, dielectric and CBN/Pt interface characteristics. The leakage current of the capacitor structure was around 0.15 A cm(-2) at an applied electric field of 30 kV cm(-1). The capacitance-voltage measurements indicated good ferroelectric polarization switching characteristics. The typical measured small signal dielectric constant and the dissipation factor at a frequency of 100 kHz were 90 and 0.053, respectively. The remanent polarization and the drive voltage values were 4.2 C cm(-2) and 1.7 V at an applied voltage of 10 V. No significant fatigue was observed at least up to 10(8) switching cycles. (c) 2005 Elsevier B.V. All rights reserved.
Issue Date: 
1-Aug-2006
Citation: 
Materials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 98, n. 2-3, p. 203-206, 2006.
Time Duration: 
203-206
Publisher: 
Elsevier B.V.
Keywords: 
  • thin films
  • annealing
  • electrical properties
Source: 
http://dx.doi.org/10.1016/j.matchemphys.2005.09.004
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/38329
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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