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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/38498
Title: 
Ferroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution deposition
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Universidade Federal de São Carlos (UFSCar)
  • Georgia Inst Technol
ISSN: 
0021-8979
Abstract: 
BiFeO3 (BFO) thin films were fabricated on Pt(111)/Ti/SiO2/Si substrates by using a polymeric precursor solution under appropriate crystallization conditions. The capacitance dependence on voltage is strongly nonlinear, confirming the ferroelectric properties of the films resulting from the domain switching. The leakage current density increases with annealing temperature. The polarization electric field curves could be obtained in BFO films annealed at 500 degrees C, free of secondary phases. X-ray photoelectron spectroscopy spectra of films annealed at 500 degrees C indicated that the oxidation state of Fe was purely 3+, demonstrating that our films possess stable chemical configurations. (c) 2007 American Institute of Physics.
Issue Date: 
1-Apr-2007
Citation: 
Journal of Applied Physics. Melville: Amer Inst Physics, v. 101, n. 7, 6 p., 2007.
Time Duration: 
6
Publisher: 
American Institute of Physics (AIP)
Source: 
http://dx.doi.org/10.1063/1.2715513
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/38498
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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