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http://acervodigital.unesp.br/handle/11449/39670
- Title:
- Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films
- Universidade Estadual Paulista (UNESP)
- Pontifícia Universidade Católica do Rio de Janeiro (PUC-Rio)
- 0925-8388
- Strong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved.
- 20-Jul-2006
- Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 418, n. 1-2, p. 35-38, 2006.
- 35-38
- Elsevier B.V.
- thin films
- semiconductors
- chemical synthesis
- electronical transport
- luminescence
- http://dx.doi.org/10.1016/j.jallcom.2005.10.066
- Acesso restrito
- outro
- http://repositorio.unesp.br/handle/11449/39670
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