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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/40277
Title: 
A Novel Plasma Technique for Surface Treatment: The Plasma Expander
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Universidade Estadual de Campinas (UNICAMP)
ISSN: 
0093-3813
Sponsorship: 
  • Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
  • Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
Abstract: 
This paper describes a new plasma treatment method: the plasma expander. In this approach, expanding shock waves are generated in a vacuum chamber by pulsed plasmas. Collisions of fast species in the waves modify the properties of solid surfaces exposed to the plasma. The degree of such modification is governed by the energy delivered by the plasma exposure. To confirm the efficacy of this approach, modifications induced in the properties of thin polymer films produced by plasma-enhanced chemical vapor deposition by exposure to nitrogen plasma shock waves were investigated. The films were prepared from benzene radio frequency plasmas and subsequently exposed to different quantities of nitrogen shock waves N-w. The effects of N-w on the wettability, molecular structure, and mechanical properties of the films were studied. Fourier transform infrared spectroscopy revealed that greater N-w resulted in the loss of C-H groups and the rupture of benzene aromatic rings observed in the structure of the as-deposited films. Furthermore, the contact angle strongly increased and the hardness, evaluated by nanoindentation, increased up to fourfold with the increase in the intensity of the treatment.
Issue Date: 
1-Feb-2012
Citation: 
IEEE Transactions on Plasma Science. Piscataway: IEEE-Inst Electrical Electronics Engineers Inc, v. 40, n. 2, p. 492-496, 2012.
Time Duration: 
492-496
Publisher: 
Institute of Electrical and Electronics Engineers (IEEE)
Keywords: 
  • Plasma-enhanced chemical vapor deposition (PECVD)
  • plasma expander
  • plasma treatment
  • surface treatment
  • thin films
Source: 
http://dx.doi.org/10.1109/TPS.2011.2178272
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/40277
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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