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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/42256
Title: 
Dielectric properties of pure and lanthanum modified bismuth titanate thin films
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Universidade Federal de São Carlos (UFSCar)
ISSN: 
0925-8388
Abstract: 
We investigated the dielectric properties of pure and lanthanum modified bismuth titanate thin films obtained by the polymeric precursor method. X-ray diffraction of the film annealed at 300 degrees C for 2h indicates a disordered structure. Lanthanum addition increases gradually the dielectric permittivity of films, keeping unchanged their loss tangent. From C-V curve we can see no hysteresis behavior indicating the absence of domain structure. The decrease in the conductivity for the heavily doped Bi4Ti3O12 (BIT) must be associated to the unidentified crystal defects. For comparison, dielectric properties of crystalline BIT film were also investigated. (C) 2007 Published by Elsevier B.V.
Issue Date: 
24-Apr-2008
Citation: 
Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 454, n. 1-2, p. 66-71, 2008.
Time Duration: 
66-71
Publisher: 
Elsevier B.V. Sa
Keywords: 
  • thin films
  • chemical synthesis
  • dielectric response
  • disordered structure
Source: 
http://dx.doi.org/10.1016/j.jallcom.2006.12.066
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/42256
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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