Thermal decomposition of vanadyl Schiff-base compounds

David, H. L.; Lonashiro, M.; Benedetti, Assis Vicente; Zamian, J. R.; Dockal, E. R.

Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/64240

Title:

Thermal decomposition of vanadyl Schiff-base compounds

Author(s):

Institution:

Universidade Estadual Paulista (UNESP)
Universidade Federal de São Carlos (UFSCar)

ISSN:

0040-6031

Abstract:

The thermal stability and thermal decomposition of several Schiff bases coordinated to vanadyl, VO (Schiff base), were studied by thermogravimetry and conventional gas Chromatographic and X-ray analyses. The kinetics, the number of steps and, in particular, the final temperature of decomposition of these complexes depend on the equatorial ligand. © 1992.

Issue Date:

19-Jun-1992

Citation:

Thermochimica Acta, v. 202, n. C, p. 45-50, 1992.

Time Duration:

45-50

Source:

http://dx.doi.org/10.1016/0040-6031(92)85148-O

URI:

Access Rights:

Acesso restrito

Type:

outro

Source:

http://repositorio.unesp.br/handle/11449/64240

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