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http://acervodigital.unesp.br/handle/11449/66760
- Title:
- Structural, dielectric and ferroelectric properties of Nb-doped PZT thin films produced by oxide precursor method
- Universidade Estadual Paulista (UNESP)
- Universidade Federal de São Carlos (UFSCar)
- 0015-0193
- 1563-5112
- Recently, was proposed a chemical method for preparation of ferroelectric thin films based on oxide precursors. In this work, PZT thin films were prepared to attest the viability of this method for cation-substitution. In this study, a small concentration of Nb (5 mol%) was selected as substitute of B-site in ABO 3 structure of PZT. Dielectric and ferroelectric properties of PZT films were studied as a function of cation-substitution. Results for Nb-PZT were compared with PZT films undoped. The values of dielectric constant, at typical 100 kHz frequency, were 358 and 137, for PZT and Nb-PZT films respectively. Remanent polarizations of these films were respectively 7.33 μ C/cm 2 and 13.3 μ C/cm 2 , while the measured coercive fields were 101 kV/cm and 93 kV/cm. As a result, changes on observed dielectric and ferroelectric values confirm the Nb substitution in PZT thin film produced by oxide precursor method. © 2002 Taylor & Francis.
- 1-Jan-2002
- Ferroelectrics, v. 270, p. 51-56.
- 51-56
- Ferroelectric
- PZT
- Thin films
- Dielectric properties
- Ferroelectricity
- Lead compounds
- Permittivity
- Polarization
- Substitution reactions
- Cation-substitution
- Oxide precursor method
- Remanent polarizations
- http://dx.doi.org/10.1080/713716104
- Acesso restrito
- outro
- http://repositorio.unesp.br/handle/11449/66760
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