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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/67502
Title: 
Erbium-activated HfO2-based waveguides for photonics
Author(s): 
Institution: 
  • Université di Trento
  • Ist. di Fotonica e Nanotecnologie
  • Università di Trento
  • Ist. di Fis. Applicata Nello Carrara
  • Universidade Estadual Paulista (UNESP)
ISSN: 
0277-786X
Abstract: 
70SiO2 - 30HfO2 planar waveguides, activated by Er3+ concentration ranging from 0.3 to 1 mol%, were prepared by solgel route, using dip-coating deposition on silica glass substrates. The waveguides showed high densification degree, effective intermingling of the two components of the film, and uniform surface morphology. Propagation losses of about 1 dB/cm were measured at 632.8 nm. When pumped with 987 nm or 514.5 nm continuous-wave laser light, the waveguides showed the 4I 13/2→4I15/2 emission band with a bandwidth of 48 nm. The spectral features were found independent both on erbium content and excitation wavelength. The 4I13/2 level decay curves presented a single exponential profile, with a lifetime between 2.9-5.0 ms, depending on the erbium concentration.
Issue Date: 
1-Dec-2003
Citation: 
Proceedings of SPIE - The International Society for Optical Engineering, v. 4829 I, p. 89-90.
Time Duration: 
89-90
Keywords: 
  • Luminescence
  • Optical materials
  • Planar waveguides
  • Silica-hafnia
  • Sol-gel, dip-coating, erbium
  • Annealing
  • Birefringence
  • Densification
  • Erbium
  • Hafnium compounds
  • Laser beams
  • Microstructure
  • Morphology
  • Photoluminescence
  • Photons
  • Refractive index
  • Silica
  • Sol-gels
  • Dip-coatings
  • Emission bands
  • Optical waveguides
Source: 
http://dx.doi.org/10.1117/12.524944
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/67502
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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