Please use this identifier to cite or link to this item:
http://acervodigital.unesp.br/handle/11449/67502
- Title:
- Erbium-activated HfO2-based waveguides for photonics
- Université di Trento
- Ist. di Fotonica e Nanotecnologie
- Università di Trento
- Ist. di Fis. Applicata Nello Carrara
- Universidade Estadual Paulista (UNESP)
- 0277-786X
- 70SiO2 - 30HfO2 planar waveguides, activated by Er3+ concentration ranging from 0.3 to 1 mol%, were prepared by solgel route, using dip-coating deposition on silica glass substrates. The waveguides showed high densification degree, effective intermingling of the two components of the film, and uniform surface morphology. Propagation losses of about 1 dB/cm were measured at 632.8 nm. When pumped with 987 nm or 514.5 nm continuous-wave laser light, the waveguides showed the 4I 13/2→4I15/2 emission band with a bandwidth of 48 nm. The spectral features were found independent both on erbium content and excitation wavelength. The 4I13/2 level decay curves presented a single exponential profile, with a lifetime between 2.9-5.0 ms, depending on the erbium concentration.
- 1-Dec-2003
- Proceedings of SPIE - The International Society for Optical Engineering, v. 4829 I, p. 89-90.
- 89-90
- Luminescence
- Optical materials
- Planar waveguides
- Silica-hafnia
- Sol-gel, dip-coating, erbium
- Annealing
- Birefringence
- Densification
- Erbium
- Hafnium compounds
- Laser beams
- Microstructure
- Morphology
- Photoluminescence
- Photons
- Refractive index
- Silica
- Sol-gels
- Dip-coatings
- Emission bands
- Optical waveguides
- http://dx.doi.org/10.1117/12.524944
- Acesso restrito
- outro
- http://repositorio.unesp.br/handle/11449/67502
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.