Please use this identifier to cite or link to this item:
http://acervodigital.unesp.br/handle/11449/73842
- Title:
- Study of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surface
- Universidade Federal da Grande Dourados (UFGD)
- Universidade de São Paulo (USP)
- Universidade Estadual Paulista (UNESP)
- 1938-5862
- 1938-6737
- This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society.
- 1-Dec-2012
- ECS Transactions, v. 43, n. 1, p. 3-7, 2012.
- 3-7
- Copper surface
- Dip-coating process
- Low concentrations
- Open circuit potential
- Polarization curves
- Substrate degradation
- Copper
- Degradation
- Electrochemical impedance spectroscopy
- Electrochemistry
- Silicon compounds
- Silicones
- Coatings
- http://dx.doi.org/10.1149/1.4704931
- Acesso restrito
- outro
- http://repositorio.unesp.br/handle/11449/73842
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