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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/9115
Title: 
Effect of helium implantation on the properties of plasma polymer films
Author(s): 
Institution: 
  • Universidade Estadual Paulista (UNESP)
  • Universidade Federal do Paraná (UFPR)
ISSN: 
0168-583X
Abstract: 
Polymer films, deposited from acetylene and argon plasma mixtures, were bombarded with 150 keV He+ ions, varying the fluence, Phi, from 10(18) to 10(21) ions/m(2). Molecular structure and optical gap of the samples were investigated by infrared and ultraviolet-visible spectroscopies, respectively. Two-point probe was employed to determine the electrical resistivity while hardness was measured by nanoindentation technique. It was verified modification of the molecular structure and composition of the films. There was loss of H and increment in the concentration of unsaturated carbon bonds with Phi. Optical gap and electrical resistivity decreased while hardness increased with Phi. Interpretation of these results is proposed in terms of chain crosslinking and unsaturation. (C) 2002 Elsevier B.V. B.V. All rights reserved.
Issue Date: 
1-May-2002
Citation: 
Nuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 191, p. 704-707, 2002.
Time Duration: 
704-707
Publisher: 
Elsevier B.V.
Keywords: 
  • plasma polymers
  • ion implantation
  • optical and electrical properties
  • hardness
Source: 
http://dx.doi.org/10.1016/S0168-583X(02)00637-7
URI: 
Access Rights: 
Acesso restrito
Type: 
outro
Source:
http://repositorio.unesp.br/handle/11449/9115
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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