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dc.contributor.authorLustosa, Glauco Meireles Mascarenhas Morandi-
dc.contributor.authorCosta, João Paulo C.-
dc.contributor.authorPerazolli, Leinig Antonio-
dc.contributor.authorZaghete, Maria Aparecida-
dc.date.accessioned2015-05-15T13:30:30Z-
dc.date.accessioned2016-10-25T20:48:49Z-
dc.date.available2015-05-15T13:30:30Z-
dc.date.available2016-10-25T20:48:49Z-
dc.date.issued2014-
dc.identifierhttp://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=9355682&fileId=S1946427414008756-
dc.identifier.citationMRS Proceedings, v. 1675, p. 197-202, 2014.-
dc.identifier.issn1946-4274-
dc.identifier.urihttp://hdl.handle.net/11449/123614-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/123614-
dc.description.abstractSnO2-based varistors are strong candidates to replace the ZnO-based varistors due to ordering fewer additives to improve its electrical behavior as well as by showing similar nonlinear characteristics of ZnO varistors. In this work, SnO2-nanoparticles based-varistors with addition of 1.0 %mol of ZnO and 0.05 %mol of Nb2O5 were synthesized by chemical route. SnO2.ZnO.Nb2O5-films with 5 μm of thickness were obtained by electrophoretic deposition (EPD) of the nanoparticles on Si/Pt substrate from alcoholic suspension of SnO2-based powder. The sintering step was carried out in a microwave oven at 1000 °C for 40 minutes. Then, Cr3+ ions were deposited on the films surface by EPD after the sintering step. Each sample was submitted to different thermal treatments to improve the varistor behavior by diffusion of ions in the samples. The films showed a nonlinear coefficient (α) greater than 9, breakdown voltage (VR) around 60 V, low leakage current (IF ≈ 10-6 A), height potential barrier above 0.5 eV and grain boundary resistivity upward of 107 Ω.cm.en
dc.format.extent197-202-
dc.language.isoeng-
dc.sourceCurrículo Lattes-
dc.subjectElectrical propertiesen
dc.subjectGrain boundariesen
dc.subjectSnen
dc.titleElectrical Properties at Grain Boundaries Influenced by Cr3+ Diffusion in SnO2.ZnO.Nb2O5-Films Varistor Prepared by Electrophoresis Depositionen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUniversidade Estadual Paulista Júlio de Mesquita Filho, Departamento de Química Tecnológica e de Aplicação, Instituto de Química de Araraquara, Araraquara, Av. Prof. Francisco Degni s/n, Quitandinha, CEP 14800-900, SP, Brasil-
dc.description.affiliationUnespUniversidade Estadual Paulista Júlio de Mesquita Filho, Departamento de Química Tecnológica e de Aplicação, Instituto de Química de Araraquara, Araraquara, Av. Prof. Francisco Degni s/n, Quitandinha, CEP 14800-900, SP, Brasil-
dc.description.affiliationUnespInstituto de Química - UNESP, Araraquara, SP, 14.800-900, Brazil-
dc.description.affiliationUnespCentro Universitário de Araraquara - UNIARA, Araraquara, SP, 14.801-340, Brazil-
dc.identifier.doihttp://dx.doi.org/10.1557/opl.2014.875-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMRS Proceedings-
dc.identifier.lattes3822723627284619-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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