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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25403
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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorRamirez, M. A.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T14:17:59Z-
dc.date.accessioned2016-10-25T17:40:16Z-
dc.date.available2014-05-20T14:17:59Z-
dc.date.available2016-10-25T17:40:16Z-
dc.date.issued2006-07-01-
dc.identifierhttp://dx.doi.org/10.1016/j.matlet.2005.12.071-
dc.identifier.citationMaterials Letters. Amsterdam: Elsevier B.V., v. 60, n. 16, p. 2020-2023, 2006.-
dc.identifier.issn0167-577X-
dc.identifier.urihttp://hdl.handle.net/11449/25403-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/25403-
dc.description.abstractFerroelectric SrBi4Ti4O15 thin films were successfully prepared on a Pt(111)/Ti/SiO2/Si(100) substrate for the first time by spin coating, using the polymeric precursor method. X-ray diffraction patterns of the films indicate that they are polycrystalline in nature. Atomic force microscopy (AFM) analyses showed that the surface of these films is smooth, dense and crack-free with low surface roughness (6.4 nm). At room temperature and at a frequency of 1 MHz, the dielectric constant and the dissipation factor were, respectively, 150 and 0.022. The C-V characteristics of perovskite thin film prepared at low temperature show normal ferrolectric behaviour. The remanent polarization and coercive field for the films deposited were 5.4 mu C/cm(2) and 8 5 kV/cm, respectively. All the capacitors showed good polarization fatigue characteristics at least up to 1 x 10(10) bipolar pulse cycles indicating that SrBi4Ti4O15 thin films can be a promising material for use in nonvolatile memories. (c) 2005 Elsevier B.V. All rights reserved.en
dc.format.extent2020-2023-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectthin filmspt
dc.subjectatomic force microscopypt
dc.subjectdielectric propertiespt
dc.subjectfatiguept
dc.titleFerroelectric characteristics of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by the soft chemical methoden
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUNESP, Inst Chem, Dept Chem Phys, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationUNESP, Mat Sci & Technol, BR-1703336 Bauru, SP, Brazil-
dc.description.affiliationUnespUNESP, Inst Chem, Dept Chem Phys, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationUnespUNESP, Mat Sci & Technol, BR-1703336 Bauru, SP, Brazil-
dc.identifier.doi10.1016/j.matlet.2005.12.071-
dc.identifier.wosWOS:000237756600020-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMaterials Letters-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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