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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25572
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dc.contributor.authorSimões, Alexandre Zirpoli-
dc.contributor.authorCavalcante, L. S.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorVarela, José Arana-
dc.contributor.authorLongo, Elson-
dc.date.accessioned2014-05-20T14:18:30Z-
dc.date.accessioned2016-10-25T17:40:34Z-
dc.date.available2014-05-20T14:18:30Z-
dc.date.available2016-10-25T17:40:34Z-
dc.date.issued2009-03-01-
dc.identifierhttp://dx.doi.org/10.1016/j.cap.2008.05.001-
dc.identifier.citationCurrent Applied Physics. Amsterdam: Elsevier B.V., v. 9, n. 2, p. 520-523, 2009.-
dc.identifier.issn1567-1739-
dc.identifier.urihttp://hdl.handle.net/11449/25572-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/25572-
dc.description.abstractThe effect of lanthanum (La) addition in BiFeO(3) (BFO) thin films deposited on Pt(111)/Ti/SiO(2)/Si(100) substrates prepared by soft chemical method was explained. Increasing La concentration promotes changes on structure, microstructure and dielectric/ferroelectric response of films. X-ray diffraction reveals that the films are free of preferred orientations and structural distortion. La addition promotes an increase in dielectric permittivity. The polarization switching and the fatigue behavior of the BFO films were significantly enhanced by the La concentration. (C) 2008 Elsevier B.V. All rights reserved.en
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)-
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)-
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)-
dc.format.extent520-523-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectFatigue resistanceen
dc.subjectBiFeO(3)en
dc.subjectFerroelectricen
dc.subjectMultiferroicen
dc.titleImprovement of fatigue resistance on La modified BiFeO(3) thin filmsen
dc.typeoutro-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUniversidade Federal de São Carlos (UFSCar), Dept Quim, LIEC, BR-13565905 São Carlos, SP, Brazil-
dc.description.affiliationUniv Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, Dept Fisicoquim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.cap.2008.05.001-
dc.identifier.wosWOS:000261360300041-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofCurrent Applied Physics-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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