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http://acervodigital.unesp.br/handle/11449/25623
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DC Field | Value | Language |
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dc.contributor.author | Carvalho, Hudson W. P. | - |
dc.contributor.author | Batista, Ana P. L. | - |
dc.contributor.author | Bertholdo, Roberto | - |
dc.contributor.author | Santilli, Celso Valentim | - |
dc.contributor.author | Pulcinelli, Sandra Helena | - |
dc.contributor.author | Ramalho, Teodorico C. | - |
dc.date.accessioned | 2014-05-20T14:18:38Z | - |
dc.date.accessioned | 2016-10-25T17:40:40Z | - |
dc.date.available | 2014-05-20T14:18:38Z | - |
dc.date.available | 2016-10-25T17:40:40Z | - |
dc.date.issued | 2010-10-01 | - |
dc.identifier | http://dx.doi.org/10.1007/s10853-010-4639-5 | - |
dc.identifier.citation | Journal of Materials Science. New York: Springer, v. 45, n. 20, p. 5698-5703, 2010. | - |
dc.identifier.issn | 0022-2461 | - |
dc.identifier.uri | http://hdl.handle.net/11449/25623 | - |
dc.identifier.uri | http://acervodigital.unesp.br/handle/11449/25623 | - |
dc.description.abstract | In this work, we study the effect of doping depth profile on the photocatalytic and surface properties of TiO2 films. Two thin film layers of TiO2 (200 nm) and Co (5 nm), respectively, were deposited by physical evaporation on glass substrate. These films were annealed for 1 s at 100 and 400 A degrees C and the Co layer was removed by chemical etching. Atomic force microscopy (AFM) phase images showed changes in the surface in function of thermal treatment. The grazing-incidence X-ray fluorescence (GIXRF) measurements indicated that the thermal treatment caused migration of Co atoms to below the surface, the depths found were between 19 and 29 nm. The contact angle showed distinct values in function of the doped profile or Co surface concentration. The UV-vis spectra presented a red shift with the increasing of thermal treatment. Photocatalytical assays were performed by methylene blue discoloration and the higher activity was found for TiO2-Co treated at 400 A degrees C, the ESI-MS showed the fragments formed during the methylene blue decomposition. | en |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de Minas Gerais (FAPEMIG) | - |
dc.description.sponsorship | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) | - |
dc.description.sponsorship | Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) | - |
dc.description.sponsorship | Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) | - |
dc.description.sponsorship | Laboratório Nacional de Luz Síncrotron (LNLS) | - |
dc.format.extent | 5698-5703 | - |
dc.language.iso | eng | - |
dc.publisher | Springer | - |
dc.source | Web of Science | - |
dc.title | Photocatalyst TiO2-Co: the effect of doping depth profile on methylene blue degradation | en |
dc.type | outro | - |
dc.contributor.institution | Universidade Estadual Paulista (UNESP) | - |
dc.contributor.institution | Universidade de São Paulo (USP) | - |
dc.contributor.institution | Universidade Federal de Lavras (UFLA) | - |
dc.description.affiliation | Univ Estadual Paulista, Inst Quim, Dept Quim Fis, BR-14800900 Araraquara, SP, Brazil | - |
dc.description.affiliation | Univ São Paulo, Inst Quim, Dept Quim Fundamental, BR-05508000 São Paulo, Brazil | - |
dc.description.affiliation | Universidade Federal de Lavras (UFLA), Dept Quim, BR-37200000 Lavras, MG, Brazil | - |
dc.description.affiliationUnesp | Univ Estadual Paulista, Inst Quim, Dept Quim Fis, BR-14800900 Araraquara, SP, Brazil | - |
dc.description.sponsorshipId | LNLS: D09B-XRF 7673/08 | - |
dc.identifier.doi | 10.1007/s10853-010-4639-5 | - |
dc.identifier.wos | WOS:000280959200035 | - |
dc.rights.accessRights | Acesso restrito | - |
dc.relation.ispartof | Journal of Materials Science | - |
Appears in Collections: | Artigos, TCCs, Teses e Dissertações da Unesp |
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