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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/32311
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dc.contributor.authorGelamo, Rogrio V.-
dc.contributor.authorLanders, Richard-
dc.contributor.authorRouxinol, Francisco P. M.-
dc.contributor.authorTrasferetti, Beneditlo C.-
dc.contributor.authorBica de Moraes, Mdrio A.-
dc.contributor.authorDavanzo, Celso U.-
dc.contributor.authorDurrant, Steven F.-
dc.date.accessioned2014-05-20T15:21:08Z-
dc.date.accessioned2016-10-25T17:54:26Z-
dc.date.available2014-05-20T15:21:08Z-
dc.date.available2016-10-25T17:54:26Z-
dc.date.issued2007-05-23-
dc.identifierhttp://dx.doi.org/10.1002/ppap.200600100-
dc.identifier.citationPlasma Processes and Polymers. Weinheim: Wiley-v C H Verlag Gmbh, v. 4, n. 4, p. 482-488, 2007.-
dc.identifier.issn1612-8850-
dc.identifier.urihttp://hdl.handle.net/11449/32311-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/32311-
dc.description.abstractThis work describes an XPS investigation of plasma-deposited polysiloxane films irradiated with 170 keV He+ ions at fluences, Phi, ranging from 1 x 10(14) to 1 x 10(16) cm(-2). Modifications in the atomic concentrations of the surface atoms with (D were revealed by changes in the [O]/[Si], [O]/[C] and [C]/[Si] atomic ratios. Surface chemical structure modifications were evidenced by the increasing C1s peak width and asymmetry as Phi was increased, due to the formation of ether and carboxyl functionalities. Moreover, structural transformations were indicated by the positive binding energy shift of the Si2p peaks, due to the increasing Si oxidation. Correlations of the XPS data with other results from previous work on polysiloxanes illustrate the role of ion beam-induced bond breaking on the structural modifications.en
dc.format.extent482-488-
dc.language.isoeng-
dc.publisherWiley-Blackwell-
dc.sourceWeb of Science-
dc.subjectchemical structurept
dc.subjecthexamethyldisiloxane (HMDSO)pt
dc.subjection irradiationpt
dc.subjectpolysiloxanept
dc.subjectplasma enhanced chemical vapor deposition (PECVD)pt
dc.subjectX-ray photoelectron spectroscopy (XPS)pt
dc.titleXPS investigation of plasma-deposited polysiloxane films irradiated with helium ionsen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUniv Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, Brazil-
dc.description.affiliationUniv Estadual Campinas, Inst Quim, BR-13085970 Campinas, SP, Brazil-
dc.description.affiliationUniv Estadual Paulista, Lab Plasma Tecnol, BR-18087180 Sorocaba, SP, Brazil-
dc.description.affiliationUnespUniv Estadual Paulista, Lab Plasma Tecnol, BR-18087180 Sorocaba, SP, Brazil-
dc.identifier.doi10.1002/ppap.200600100-
dc.identifier.wosWOS:000247327800015-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofPlasma Processes and Polymers-
dc.identifier.orcid0000-0002-4511-3768pt
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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