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http://acervodigital.unesp.br/handle/11449/32311
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DC Field | Value | Language |
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dc.contributor.author | Gelamo, Rogrio V. | - |
dc.contributor.author | Landers, Richard | - |
dc.contributor.author | Rouxinol, Francisco P. M. | - |
dc.contributor.author | Trasferetti, Beneditlo C. | - |
dc.contributor.author | Bica de Moraes, Mdrio A. | - |
dc.contributor.author | Davanzo, Celso U. | - |
dc.contributor.author | Durrant, Steven F. | - |
dc.date.accessioned | 2014-05-20T15:21:08Z | - |
dc.date.accessioned | 2016-10-25T17:54:26Z | - |
dc.date.available | 2014-05-20T15:21:08Z | - |
dc.date.available | 2016-10-25T17:54:26Z | - |
dc.date.issued | 2007-05-23 | - |
dc.identifier | http://dx.doi.org/10.1002/ppap.200600100 | - |
dc.identifier.citation | Plasma Processes and Polymers. Weinheim: Wiley-v C H Verlag Gmbh, v. 4, n. 4, p. 482-488, 2007. | - |
dc.identifier.issn | 1612-8850 | - |
dc.identifier.uri | http://hdl.handle.net/11449/32311 | - |
dc.identifier.uri | http://acervodigital.unesp.br/handle/11449/32311 | - |
dc.description.abstract | This work describes an XPS investigation of plasma-deposited polysiloxane films irradiated with 170 keV He+ ions at fluences, Phi, ranging from 1 x 10(14) to 1 x 10(16) cm(-2). Modifications in the atomic concentrations of the surface atoms with (D were revealed by changes in the [O]/[Si], [O]/[C] and [C]/[Si] atomic ratios. Surface chemical structure modifications were evidenced by the increasing C1s peak width and asymmetry as Phi was increased, due to the formation of ether and carboxyl functionalities. Moreover, structural transformations were indicated by the positive binding energy shift of the Si2p peaks, due to the increasing Si oxidation. Correlations of the XPS data with other results from previous work on polysiloxanes illustrate the role of ion beam-induced bond breaking on the structural modifications. | en |
dc.format.extent | 482-488 | - |
dc.language.iso | eng | - |
dc.publisher | Wiley-Blackwell | - |
dc.source | Web of Science | - |
dc.subject | chemical structure | pt |
dc.subject | hexamethyldisiloxane (HMDSO) | pt |
dc.subject | ion irradiation | pt |
dc.subject | polysiloxane | pt |
dc.subject | plasma enhanced chemical vapor deposition (PECVD) | pt |
dc.subject | X-ray photoelectron spectroscopy (XPS) | pt |
dc.title | XPS investigation of plasma-deposited polysiloxane films irradiated with helium ions | en |
dc.type | outro | - |
dc.contributor.institution | Universidade Estadual de Campinas (UNICAMP) | - |
dc.contributor.institution | Universidade Estadual Paulista (UNESP) | - |
dc.description.affiliation | Univ Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, Brazil | - |
dc.description.affiliation | Univ Estadual Campinas, Inst Quim, BR-13085970 Campinas, SP, Brazil | - |
dc.description.affiliation | Univ Estadual Paulista, Lab Plasma Tecnol, BR-18087180 Sorocaba, SP, Brazil | - |
dc.description.affiliationUnesp | Univ Estadual Paulista, Lab Plasma Tecnol, BR-18087180 Sorocaba, SP, Brazil | - |
dc.identifier.doi | 10.1002/ppap.200600100 | - |
dc.identifier.wos | WOS:000247327800015 | - |
dc.rights.accessRights | Acesso restrito | - |
dc.relation.ispartof | Plasma Processes and Polymers | - |
dc.identifier.orcid | 0000-0002-4511-3768 | pt |
Appears in Collections: | Artigos, TCCs, Teses e Dissertações da Unesp |
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