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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/34020
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dc.contributor.authorAlmeida, CMVB-
dc.contributor.authorRaboczkay, T.-
dc.contributor.authorGiannetti, B. F.-
dc.date.accessioned2014-05-20T15:23:11Z-
dc.date.accessioned2016-10-25T17:57:03Z-
dc.date.available2014-05-20T15:23:11Z-
dc.date.available2016-10-25T17:57:03Z-
dc.date.issued1999-01-01-
dc.identifierhttp://dx.doi.org/10.1023/A:1003468731553-
dc.identifier.citationJournal of Applied Electrochemistry. Dordrecht: Kluwer Academic Publ, v. 29, n. 1, p. 123-128, 1999.-
dc.identifier.issn0021-891X-
dc.identifier.urihttp://hdl.handle.net/11449/34020-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/34020-
dc.description.abstractPotentiostatic and potentiodynamic studies were carried out to establish the inhibiting effects of citric acid on the pitting corrosion of tin. The critical potential (E-crit), which leads to pitting or general corrosion, was determined in sodium perchlorate solution in the pH range 1.0 to 4.0. Pit nucleation and growth, at pH 4.0, can be described by instantaneous nucleation followed by progressive nucleation. The results show that the minimum acid concentration needed to inhibit pitting of tin is 10(-2) M. Pitting occurrence by direct interaction between metal and perchlorate anions was observed.en
dc.format.extent123-128-
dc.language.isoeng-
dc.publisherKluwer Academic Publ-
dc.sourceWeb of Science-
dc.subjecttinpt
dc.subjectperchloratept
dc.subjectcitric acidpt
dc.subjectpittingpt
dc.subjectinhibitionpt
dc.titleInhibiting effect of citric acid on the pitting corrosion of tinen
dc.typeoutro-
dc.contributor.institutionUniversidade de São Paulo (USP)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUniv São Paulo, Inst Quim, BR-05599970 São Paulo, Brazil-
dc.description.affiliationUniv Estadual Paulista, Inst Ciências Exatas & Tecnol, BR-04026002 São Paulo, Brazil-
dc.description.affiliationUnespUniv Estadual Paulista, Inst Ciências Exatas & Tecnol, BR-04026002 São Paulo, Brazil-
dc.identifier.doi10.1023/A:1003468731553-
dc.identifier.wosWOS:000078971700018-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofJournal of Applied Electrochemistry-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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