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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorCruz, M. P.-
dc.contributor.authorRies, A.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.contributor.authorRamesh, R.-
dc.date.accessioned2014-05-20T15:23:15Z-
dc.date.accessioned2016-10-25T17:57:10Z-
dc.date.available2014-05-20T15:23:15Z-
dc.date.available2016-10-25T17:57:10Z-
dc.date.issued2007-05-03-
dc.identifierhttp://dx.doi.org/10.1016/j.materresbull.2006.08.006-
dc.identifier.citationMaterials Research Bulletin. Oxford: Pergamon-Elsevier B.V., v. 42, n. 5, p. 975-981, 2007.-
dc.identifier.issn0025-5408-
dc.identifier.urihttp://hdl.handle.net/11449/34076-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/34076-
dc.description.abstractBismuth titanate (Bi4Ti3O12, BIT) films were evaluated for use as lead-free piezoelectric thin films in micro-electromechanical systems. The films were grown by the polymeric precursor method on LaNiO3/SiO2/Si (1 0 0) (LNO), RuO2/SiO2/Si (1 0 0) (RuO2) and Pt/Ti/SiO2/Si (1 0 0) (Pt) bottom electrodes in a microwave furnace at 700 degrees C for 10 min. The domain structure was investigated by piezoresponse force microscopy (PFM). Although the converse piezoelectric coefficient, d(33), regardless of bottom electrode is around (similar to 40 pm/V), those over RuO2 and LNO exhibit better ferroelectric properties, higher remanent polarization (15 and 10 mu C/cm(2)), lower drive voltages (2.6 and 1.3 V) and are fatigue-free. The experimental results demonstrated that the combination of the polymeric precursor method assisted with a microwave furnace is a promising technique to obtain films with good qualities for applications in ferroelectric and piezoelectric devices. (c) 2006 Elsevier Ltd. All rights reserved.en
dc.format.extent975-981-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectthin filmspt
dc.subjectchemical synthesispt
dc.subjectferroelectricitypt
dc.titleFerroelectric and piezoelectric properties of bismuth titanate thin films grown on different bottom electrodes by soft chemical solution and microwave annealingen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniv Nacl Autonoma Mexico-
dc.contributor.institutionUniv Calif Berkeley-
dc.description.affiliationUniv Estadual Paulista, Inst Chem, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationUniv Nacl Autonoma Mexico, CCMC, Ensenada 22800, Baja California, Mexico-
dc.description.affiliationUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA-
dc.description.affiliationUniv Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA-
dc.description.affiliationUnespUniv Estadual Paulista, Inst Chem, BR-14801970 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.materresbull.2006.08.006-
dc.identifier.wosWOS:000245842600024-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMaterials Research Bulletin-
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