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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorRies, A.-
dc.contributor.authorFilho, F. M.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorVarela, José Arana-
dc.contributor.authorLongo, Elson-
dc.identifier.citationApplied Physics Letters. Melville: Amer Inst Physics, v. 85, n. 24, p. 5962-5964, 2004.-
dc.description.abstractFatigue-free Bi3.25La0.75Ti3O12 (BLT) thin films were grown on LaNiO3,RuO2, and La0.5Sr0.5CoO3 bottom electrodes in a microwave furnace at 700 degreesC for 10 min. The remanent polarization (P-r) and the drive voltage (V-c) were in the range of 11-23 muC/cm(2) and 0.86-1.56 V, respectively, and are better than the values found in the literature. The BLT capacitors did not show any significant fatigue up to 10(10) read/write switching cycles. (C) 2004 American Institute of Physics.en
dc.publisherAmerican Institute of Physics (AIP)-
dc.sourceWeb of Science-
dc.titleFatigue-free behavior of Bi3.25La0.75Ti3O12 thin films grown on several bottom eletrodes by the polymeric precursor methoden
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.description.affiliationPaulista State Univ, UNESP, Inst Chem, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationUniv Fed Sao Carlos, Dept Chem, BR-13560905 Sao Carlos, SP, Brazil-
dc.description.affiliationUnespPaulista State Univ, UNESP, Inst Chem, BR-14801970 Araraquara, SP, Brazil-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofApplied Physics Letters-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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