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dc.contributor.authorLee, EJH-
dc.contributor.authorPontes, F. M.-
dc.contributor.authorLeite, E. R.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorMagnani, R.-
dc.contributor.authorPizani, P. S.-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T15:28:28Z-
dc.date.accessioned2016-10-25T18:03:31Z-
dc.date.available2014-05-20T15:28:28Z-
dc.date.available2016-10-25T18:03:31Z-
dc.date.issued2004-04-01-
dc.identifierhttp://dx.doi.org/10.1016/j.matlet.2003.10.047-
dc.identifier.citationMaterials Letters. Amsterdam: Elsevier B.V., v. 58, n. 11, p. 1715-1721, 2004.-
dc.identifier.issn0167-577X-
dc.identifier.urihttp://hdl.handle.net/11449/38267-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/38267-
dc.description.abstractBarium titanate thin films were prepared by the polymeric precursor method and deposited onto Pt/Ti/SiO2/Si substrates. X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FT-IR) and micro-Raman spectroscopy were used to investigate the formation of the BaTiO3 perovskite phase. Afterwards, the films were submitted to post-annealing treatments in oxygen and nitrogen atmospheres at 300 degreesC for 2 h, and had their dielectric properties measured. It was observed that the electric properties of the thin films are very sensitive to the nature of the post-annealing atmosphere. This study demonstrates that post-annealing in an oxygen atmosphere increases the dielectric relaxation phenomenon and that post-annealing in a nitrogen atmosphere produces a slight dielectric relaxation. (C) 2004 Elsevier B.V All rights reserved.en
dc.format.extent1715-1721-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectbarium titanatept
dc.subjectdielectric propertiespt
dc.subjectconduction mechanismpt
dc.subjectpost-annealingpt
dc.titleEffects of post-annealing on the dielectric properties of Au/BaTiO3/Pt thin film capacitorsen
dc.typeoutro-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUFSCar, Dept Chem, CMDMC, LIEC, BR-13565905 Sao Carlos, SP, Brazil-
dc.description.affiliationUFSCar, Dept Phys, BR-13565905 Sao Carlos, SP, Brazil-
dc.description.affiliationUNESP, Inst Chem, Araraquara, SP, Brazil-
dc.description.affiliationUnespUNESP, Inst Chem, Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.matlet.2003.10.047-
dc.identifier.wosWOS:000220244900011-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMaterials Letters-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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