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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/38329
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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorRamirez, M. A.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorGonzalez, AHM-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T15:28:32Z-
dc.date.accessioned2016-10-25T18:03:37Z-
dc.date.available2014-05-20T15:28:32Z-
dc.date.available2016-10-25T18:03:37Z-
dc.date.issued2006-08-01-
dc.identifierhttp://dx.doi.org/10.1016/j.matchemphys.2005.09.004-
dc.identifier.citationMaterials Chemistry and Physics. Lausanne: Elsevier B.V. Sa, v. 98, n. 2-3, p. 203-206, 2006.-
dc.identifier.issn0254-0584-
dc.identifier.urihttp://hdl.handle.net/11449/38329-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/38329-
dc.description.abstractWe report the successful deposition of CaBi2Nb2O9 (CBN) thin films on platinum coated silicon substrates by polymeric precursor method. The CBN thin films exhibited good structural, dielectric and CBN/Pt interface characteristics. The leakage current of the capacitor structure was around 0.15 A cm(-2) at an applied electric field of 30 kV cm(-1). The capacitance-voltage measurements indicated good ferroelectric polarization switching characteristics. The typical measured small signal dielectric constant and the dissipation factor at a frequency of 100 kHz were 90 and 0.053, respectively. The remanent polarization and the drive voltage values were 4.2 C cm(-2) and 1.7 V at an applied voltage of 10 V. No significant fatigue was observed at least up to 10(8) switching cycles. (c) 2005 Elsevier B.V. All rights reserved.en
dc.format.extent203-206-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectthin filmspt
dc.subjectannealingpt
dc.subjectelectrical propertiespt
dc.titleSynthesis and electrical characterization of CaBi2Nb2O9 thin films deposited on Pt/Ti/SiO2/Si substrates by polymeric precursor methoden
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.description.affiliationPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationFed Univ Sao Carlos, Chem Dept, UFSCar, BR-13560905 Sao Carlos, SP, Brazil-
dc.description.affiliationUnespPaulsita State Univ, Chem Inst, UNESP, BR-14801970 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.matchemphys.2005.09.004-
dc.identifier.wosWOS:000238298100004-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMaterials Chemistry and Physics-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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