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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/38498
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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorGonzalez, A. H. M.-
dc.contributor.authorCavalcante, L. S.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T15:28:44Z-
dc.date.accessioned2016-10-25T18:03:54Z-
dc.date.available2014-05-20T15:28:44Z-
dc.date.available2016-10-25T18:03:54Z-
dc.date.issued2007-04-01-
dc.identifierhttp://dx.doi.org/10.1063/1.2715513-
dc.identifier.citationJournal of Applied Physics. Melville: Amer Inst Physics, v. 101, n. 7, 6 p., 2007.-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/11449/38498-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/38498-
dc.description.abstractBiFeO3 (BFO) thin films were fabricated on Pt(111)/Ti/SiO2/Si substrates by using a polymeric precursor solution under appropriate crystallization conditions. The capacitance dependence on voltage is strongly nonlinear, confirming the ferroelectric properties of the films resulting from the domain switching. The leakage current density increases with annealing temperature. The polarization electric field curves could be obtained in BFO films annealed at 500 degrees C, free of secondary phases. X-ray photoelectron spectroscopy spectra of films annealed at 500 degrees C indicated that the oxidation state of Fe was purely 3+, demonstrating that our films possess stable chemical configurations. (c) 2007 American Institute of Physics.en
dc.format.extent6-
dc.language.isoeng-
dc.publisherAmerican Institute of Physics (AIP)-
dc.sourceWeb of Science-
dc.titleFerroelectric characteristics of BiFeO3 thin films prepared via a simple chemical solution depositionen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.contributor.institutionGeorgia Inst Technol-
dc.description.affiliationUniv Estadual Paulista, Dept Quim, Fac Ciências, BR-19033360 São Paulo, Brazil-
dc.description.affiliationUniv Fed Sao Carlos, Dept Quim, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 São Paulo, Brazil-
dc.description.affiliationGeorgia Inst Technol, Sch Chem & Biochem, Atlanta, GA 30332 USA-
dc.description.affiliationUnespUniv Estadual Paulista, Dept Quim, Fac Ciências, BR-19033360 São Paulo, Brazil-
dc.identifier.doi10.1063/1.2715513-
dc.identifier.wosWOS:000245691000070-
dc.rights.accessRightsAcesso restrito-
dc.identifier.fileWOS000245691000070.pdf-
dc.relation.ispartofJournal of Applied Physics-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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