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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/39670
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dc.contributor.authorLima, SAM-
dc.contributor.authorDavolos, Marian Rosaly-
dc.contributor.authorLegnani, C.-
dc.contributor.authorQuirino, W. G.-
dc.contributor.authorCremona, M.-
dc.date.accessioned2014-05-20T15:30:14Z-
dc.date.accessioned2016-10-25T18:05:41Z-
dc.date.available2014-05-20T15:30:14Z-
dc.date.available2016-10-25T18:05:41Z-
dc.date.issued2006-07-20-
dc.identifierhttp://dx.doi.org/10.1016/j.jallcom.2005.10.066-
dc.identifier.citationJournal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 418, n. 1-2, p. 35-38, 2006.-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://hdl.handle.net/11449/39670-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/39670-
dc.description.abstractStrong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved.en
dc.format.extent35-38-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectthin filmspt
dc.subjectsemiconductorspt
dc.subjectchemical synthesispt
dc.subjectelectronical transportpt
dc.subjectluminescencept
dc.titleLow voltage electroluminescence of terbium- and thulium-doped zinc oxide filmsen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionPontifícia Universidade Católica do Rio de Janeiro (PUC-Rio)-
dc.description.affiliationUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil-
dc.description.affiliationPUC Rio, Dept Fis, BR-22453900 Rio de Janeiro, Brazil-
dc.description.affiliationUnespUNESP, Inst Quim, BR-14801970 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.jallcom.2005.10.066-
dc.identifier.wosWOS:000238781500006-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofJournal of Alloys and Compounds-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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