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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/64240
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dc.contributor.authorDavid, H. L.-
dc.contributor.authorLonashiro, M.-
dc.contributor.authorBenedetti, Assis Vicente-
dc.contributor.authorZamian, J. R.-
dc.contributor.authorDockal, E. R.-
dc.date.accessioned2014-05-27T11:17:28Z-
dc.date.accessioned2016-10-25T18:12:55Z-
dc.date.available2014-05-27T11:17:28Z-
dc.date.available2016-10-25T18:12:55Z-
dc.date.issued1992-06-19-
dc.identifierhttp://dx.doi.org/10.1016/0040-6031(92)85148-O-
dc.identifier.citationThermochimica Acta, v. 202, n. C, p. 45-50, 1992.-
dc.identifier.issn0040-6031-
dc.identifier.urihttp://hdl.handle.net/11449/64240-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/64240-
dc.description.abstractThe thermal stability and thermal decomposition of several Schiff bases coordinated to vanadyl, VO (Schiff base), were studied by thermogravimetry and conventional gas Chromatographic and X-ray analyses. The kinetics, the number of steps and, in particular, the final temperature of decomposition of these complexes depend on the equatorial ligand. © 1992.en
dc.format.extent45-50-
dc.language.isoeng-
dc.sourceScopus-
dc.titleThermal decomposition of vanadyl Schiff-base compoundsen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.description.affiliationInstituto de Química UNESP, Caixa Postal 355, Araraquara, SP-
dc.description.affiliationDepartamento de Química Universidade Federal de São Carlos, Caixa Postal 676, São Carlos, SP-
dc.description.affiliationUnespInstituto de Química UNESP, Caixa Postal 355, Araraquara, SP-
dc.identifier.doi10.1016/0040-6031(92)85148-O-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofThermochimica Acta-
dc.identifier.scopus2-s2.0-0040829299-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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