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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/66522
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dc.contributor.authorJiménez Pérez, J. L.-
dc.contributor.authorSakanaka, P. H.-
dc.contributor.authorAlgatti, M. A.-
dc.contributor.authorMendoza-Alvarez, J. G.-
dc.contributor.authorCruz Orea, A.-
dc.date.accessioned2014-05-27T11:20:16Z-
dc.date.accessioned2016-10-25T18:17:03Z-
dc.date.available2014-05-27T11:20:16Z-
dc.date.available2016-10-25T18:17:03Z-
dc.date.issued2001-05-15-
dc.identifierhttp://dx.doi.org/10.1016/S0169-4332(01)00144-1-
dc.identifier.citationApplied Surface Science, v. 175-176, p. 709-714.-
dc.identifier.issn0169-4332-
dc.identifier.urihttp://hdl.handle.net/11449/66522-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/66522-
dc.description.abstractThis paper presents the theoretical and experimental results for oxide thin film growth on titanium films previously deposited over glass substrate. Ti films of thickness 0.1 μm were heated by Nd:YAG laser pulses in air. The oxide tracks were created by moving the samples with a constant speed of 2 mm/s, under the laser action. The micro-topographic analysis of the tracks was performed by a microprofiler. The results taken along a straight line perpendicular to the track axis revealed a Gaussian profile that closely matches the laser's spatial mode profile, indicating the effectiveness of the surface temperature gradient on the film's growth process. The sample's micro-Raman spectra showed two strong bands at 447 and 612 cm -1 associated with the TiO 2 structure. This is a strong indication that thermo-oxidation reactions took place at the Ti film surface that reached an estimated temperature of 1160 K just due to the action of the first pulse. The results obtained from the numerical integration of the analytical equation which describes the oxidation rate (Wagner equation) are in agreement with the experimental data for film thickness in the high laser intensity region. This shows the partial accuracy of the one-dimensional model adopted for describing the film growth rate. © 2001 Elsevier Science B.V.en
dc.format.extent709-714-
dc.language.isoeng-
dc.sourceScopus-
dc.subjectLaser materials processing-
dc.subjectLaser-induced oxidation-
dc.subjectThin oxide films-
dc.subjectMathematical models-
dc.subjectNeodymium lasers-
dc.subjectOxides-
dc.subjectPulsed laser applications-
dc.subjectThermooxidation-
dc.subjectThin films-
dc.subjectTitanium-
dc.subjectLaser heating-
dc.subjectLaser induced oxidation-
dc.subjectFilm growth-
dc.titleOne-dimensional analytical model for oxide thin film growth on Ti metal layers during laser heating in airen
dc.typeoutro-
dc.contributor.institutionCentro de Investigación en Ciencia Aplicada y Tecnología Avanzada (CICATA)-
dc.contributor.institutionUniversidade Estadual de Campinas (UNICAMP)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionCentro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional (CINVESTAV-IPN)-
dc.description.affiliationCICATA-IPN Legaria 694, D.F. 11500, México City-
dc.description.affiliationInstituto de Física Univ. Estadual Campinas C., Campinas-
dc.description.affiliationUNESP Campus de Guaratinguetá, SP, Guaratinguetá-
dc.description.affiliationDepartamento de Física CINVESTAV-IPN, D.F. 07300, México City-
dc.description.affiliationUnespUNESP Campus de Guaratinguetá, SP, Guaratinguetá-
dc.identifier.doi10.1016/S0169-4332(01)00144-1-
dc.identifier.wosWOS:000169032100116-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofApplied Surface Science-
dc.identifier.scopus2-s2.0-16644370473-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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