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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/66675
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dc.contributor.authorRangel, Elidiane C.-
dc.contributor.authorCruz, Nilson C.-
dc.contributor.authorMota, Rogério Pinto-
dc.contributor.authorAlgatti, Maurício A.-
dc.contributor.authorHonda, Roberto Y.-
dc.contributor.authorKuranaga, Carlos-
dc.contributor.authorDa Silva, Marcos D.-
dc.date.accessioned2014-05-27T11:20:21Z-
dc.date.accessioned2016-10-25T18:17:21Z-
dc.date.available2014-05-27T11:20:21Z-
dc.date.available2016-10-25T18:17:21Z-
dc.date.issued2001-12-01-
dc.identifierhttp://dx.doi.org/10.1557/PROC-671-O8.17-
dc.identifier.citationMaterials Research Society Symposium - Proceedings, v. 672.-
dc.identifier.issn0272-9172-
dc.identifier.urihttp://hdl.handle.net/11449/66675-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/66675-
dc.description.abstractThin polymer films were deposited from acetylene and argon mixtures by plasma immersion ion implantation and deposition. The effect of the pulse frequency, v, on molecular structure, optical gap, contact angle and hardness of the films was investigated. It was observed progressive dehydrogenation of the samples and increment in the concentration of unsaturated carbon bonds as the pulse frequency was increased. Film hardness and contact angle increased and optical gap decreased with v. These results are interpreted in terms of the chain unsaturation and crosslinking.en
dc.language.isoeng-
dc.sourceScopus-
dc.subjectAcetylene-
dc.subjectArgon-
dc.subjectChemical bonds-
dc.subjectContact angle-
dc.subjectDehydrogenation-
dc.subjectDeposition-
dc.subjectHardness-
dc.subjectIon implantation-
dc.subjectMolecular structure-
dc.subjectOptical properties-
dc.subjectPlasma applications-
dc.subjectThin films-
dc.subjectCarbon bonds-
dc.subjectOptical gap-
dc.subjectPlasma immersion ion implantation and deposition-
dc.subjectPulse frequency-
dc.subjectThin polymer films-
dc.subjectOrganic polymers-
dc.titleThe improvement of thin polymer film properties through plasma immersion ion implantation and deposition techniqueen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationLaboratorio de Plasmas e Aplicacoes Universidade Estadual Paulista, Guaratingueta, SP 12516-410-
dc.description.affiliationUnespLaboratorio de Plasmas e Aplicacoes Universidade Estadual Paulista, Guaratingueta, SP 12516-410-
dc.identifier.doi10.1557/PROC-671-O8.17-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofMaterials Research Society Symposium Proceedings-
dc.identifier.scopus2-s2.0-0035557919-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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