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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/68697
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dc.contributor.authorMichels, Alexandre F.-
dc.contributor.authorMenegotto, Thiago-
dc.contributor.authorGrieneisen, Hans Peter H.-
dc.contributor.authorSantilli, Celso Valentim-
dc.contributor.authorHorowitz, Flavio-
dc.date.accessioned2014-05-27T11:21:46Z-
dc.date.accessioned2016-10-25T18:21:46Z-
dc.date.available2014-05-27T11:21:46Z-
dc.date.available2016-10-25T18:21:46Z-
dc.date.issued2005-12-23-
dc.identifierhttp://dx.doi.org/10.1117/12.617967-
dc.identifier.citationProceedings of SPIE - The International Society for Optical Engineering, v. 5870, p. 1-6.-
dc.identifier.issn0277-786X-
dc.identifier.urihttp://hdl.handle.net/11449/68697-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/68697-
dc.description.abstractA brief overview of optical monitoring for vacuum and wet bench film deposition processes is presented. Interferometric and polarimetric measurements are combined with regard to simultaneous real-time monitoring of refractive index and physical thickness. Monitor stability and accuracy are verified with transparent oil standards. This double optical technique is applied to dip coating with a multi-component Zirconyl Chloride aqueous solution, whose time varying refractive index and physical thickness curves indicate significant sensitivity to changes of film flow properties during the process.en
dc.format.extent1-6-
dc.language.isoeng-
dc.sourceScopus-
dc.subjectOptical properties-
dc.subjectQuality control-
dc.subjectReflection-
dc.subjectRefractive index-
dc.subjectOptical monitoring-
dc.subjectPhysical thickness-
dc.subjectPolarimetric measurements-
dc.subjectThin films-
dc.titleDouble optical monitoring of time-dependent film formationen
dc.typeoutro-
dc.contributor.institutionUniversidade Federal do Rio Grande do Sul (UFRGS)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationInstituto de Física Universidade Federal do Rio Grande do Sul (UFRGS) Campus do Vale, CP15051, 91501-970 Porto Alegre, RS-
dc.description.affiliationPrograma de Pós-Graduação em Microeletrônica (PGMicro) Universidade Federal do Rio Grande do Sul (UFRGS) Campus do Vale, CP15051, 91501-970 Porto Alegre, RS-
dc.description.affiliationInstituto de Química Universidade Estadual de São Paulo (UNESP), 14800-900 Araraquara, SP-
dc.description.affiliationUnespInstituto de Química Universidade Estadual de São Paulo (UNESP), 14800-900 Araraquara, SP-
dc.identifier.doi10.1117/12.617967-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineering-
dc.identifier.scopus2-s2.0-29144506747-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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