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http://acervodigital.unesp.br/handle/11449/68697
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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Michels, Alexandre F. | - |
dc.contributor.author | Menegotto, Thiago | - |
dc.contributor.author | Grieneisen, Hans Peter H. | - |
dc.contributor.author | Santilli, Celso Valentim | - |
dc.contributor.author | Horowitz, Flavio | - |
dc.date.accessioned | 2014-05-27T11:21:46Z | - |
dc.date.accessioned | 2016-10-25T18:21:46Z | - |
dc.date.available | 2014-05-27T11:21:46Z | - |
dc.date.available | 2016-10-25T18:21:46Z | - |
dc.date.issued | 2005-12-23 | - |
dc.identifier | http://dx.doi.org/10.1117/12.617967 | - |
dc.identifier.citation | Proceedings of SPIE - The International Society for Optical Engineering, v. 5870, p. 1-6. | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | http://hdl.handle.net/11449/68697 | - |
dc.identifier.uri | http://acervodigital.unesp.br/handle/11449/68697 | - |
dc.description.abstract | A brief overview of optical monitoring for vacuum and wet bench film deposition processes is presented. Interferometric and polarimetric measurements are combined with regard to simultaneous real-time monitoring of refractive index and physical thickness. Monitor stability and accuracy are verified with transparent oil standards. This double optical technique is applied to dip coating with a multi-component Zirconyl Chloride aqueous solution, whose time varying refractive index and physical thickness curves indicate significant sensitivity to changes of film flow properties during the process. | en |
dc.format.extent | 1-6 | - |
dc.language.iso | eng | - |
dc.source | Scopus | - |
dc.subject | Optical properties | - |
dc.subject | Quality control | - |
dc.subject | Reflection | - |
dc.subject | Refractive index | - |
dc.subject | Optical monitoring | - |
dc.subject | Physical thickness | - |
dc.subject | Polarimetric measurements | - |
dc.subject | Thin films | - |
dc.title | Double optical monitoring of time-dependent film formation | en |
dc.type | outro | - |
dc.contributor.institution | Universidade Federal do Rio Grande do Sul (UFRGS) | - |
dc.contributor.institution | Universidade Estadual Paulista (UNESP) | - |
dc.description.affiliation | Instituto de Física Universidade Federal do Rio Grande do Sul (UFRGS) Campus do Vale, CP15051, 91501-970 Porto Alegre, RS | - |
dc.description.affiliation | Programa de Pós-Graduação em Microeletrônica (PGMicro) Universidade Federal do Rio Grande do Sul (UFRGS) Campus do Vale, CP15051, 91501-970 Porto Alegre, RS | - |
dc.description.affiliation | Instituto de Química Universidade Estadual de São Paulo (UNESP), 14800-900 Araraquara, SP | - |
dc.description.affiliationUnesp | Instituto de Química Universidade Estadual de São Paulo (UNESP), 14800-900 Araraquara, SP | - |
dc.identifier.doi | 10.1117/12.617967 | - |
dc.rights.accessRights | Acesso restrito | - |
dc.relation.ispartof | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.identifier.scopus | 2-s2.0-29144506747 | - |
Appears in Collections: | Artigos, TCCs, Teses e Dissertações da Unesp |
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