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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/71498
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dc.contributor.authorHorta, D. G.-
dc.contributor.authorAcciari, H. A.-
dc.contributor.authorBevilaqua, D.-
dc.contributor.authorBenedetti, Assis Vicente-
dc.contributor.authorGarcia, O.-
dc.date.accessioned2014-05-27T11:24:35Z-
dc.date.accessioned2016-10-25T18:28:12Z-
dc.date.available2014-05-27T11:24:35Z-
dc.date.available2016-10-25T18:28:12Z-
dc.date.issued2009-12-28-
dc.identifierhttp://dx.doi.org/10.4028/www.scientific.net/AMR.71-73.397-
dc.identifier.citationAdvanced Materials Research, v. 71-73, p. 397-400.-
dc.identifier.issn1022-6680-
dc.identifier.urihttp://hdl.handle.net/11449/71498-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/71498-
dc.description.abstractIt is believed that the dissolution of chalcopyrite (CuFeS2) in acid medium can be accelerated by the addition of Cl- ions, which modify the electrochemical reactions in the leaching system. Electrochemical noise analysis (ENA) was utilized to evaluate the effect of the Cl- ions and Acidithiobacillus ferrooxidans on the oxidative dissolution of a CPE-chalcopyrite (carbon paste electrode modified with chalcopyrite) in acid medium. The emphasis was on the analysis of the admittance plots (Ac) calculated by ENA. In general, a stable passive behavior was observed, mainly during the initial stages of CPE-chalcopyrite immersion, characterized by a low passive current and a low dispersion of the Ac plots, mainly after bacteria addition. This can be explained by the adhesion of bacterial cells on the CPE-chalcopyrite surface acting as a physical barrier. The greater dispersions in the Ac plots occurred immediately after the Cl- ions addition, in the absence of bacteria characterizing an active-state. In the presence of bacteria the addition of Clions only produced some effect after some time due to the barrier effect caused by bacteria adhesion. © (2009) Trans Tech Publications.en
dc.format.extent397-400-
dc.language.isoeng-
dc.sourceScopus-
dc.subjectAdmittance-
dc.subjectBioleaching-
dc.subjectChalcopyrite-
dc.subjectElectrochemical noise analysis-
dc.subjectAcid medium-
dc.subjectAcidithiobacillus ferrooxidans-
dc.subjectBacterial cells-
dc.subjectBarrier effects-
dc.subjectCarbon paste electrode-
dc.subjectChloride ions-
dc.subjectCl- ions-
dc.subjectElectrochemical Noise Analysis-
dc.subjectElectrochemical reactions-
dc.subjectFerrooxidans-
dc.subjectInitial stages-
dc.subjectOxidative dissolution-
dc.subjectPassive behavior-
dc.subjectPhysical barriers-
dc.subjectAcids-
dc.subjectAdhesion-
dc.subjectBacteriology-
dc.subjectCell adhesion-
dc.subjectChlorine compounds-
dc.subjectCopper compounds-
dc.subjectDispersions-
dc.subjectDissolution-
dc.subjectElectric network analysis-
dc.subjectIons-
dc.subjectSurface chemistry-
dc.subjectMetal recovery-
dc.titleThe effect of chloride ions and A. ferrooxidans on the oxidative dissolution of the chalcopyrite evaluated by electrochemical noise analysis (ENA)en
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationSão Paulo State University UNESP Institute of Chemistry, Post Box 355, 14801-970, Araraquara, SP-
dc.description.affiliationUnespSão Paulo State University UNESP Institute of Chemistry, Post Box 355, 14801-970, Araraquara, SP-
dc.identifier.doi10.4028/www.scientific.net/AMR.71-73.397-
dc.identifier.wosWOS:000273541600088-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofAdvanced Materials Research-
dc.identifier.scopus2-s2.0-72449125605-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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