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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/73842
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dc.contributor.authorBasho, É N.-
dc.contributor.authorSakai, R. T.-
dc.contributor.authorDa Cruz, F. M D L-
dc.contributor.authorDe Melo, H. G.-
dc.contributor.authorBenedetti, Assis Vicente-
dc.contributor.authorSuegama, P. H.-
dc.date.accessioned2014-05-27T11:27:19Z-
dc.date.accessioned2016-10-25T18:40:08Z-
dc.date.available2014-05-27T11:27:19Z-
dc.date.available2016-10-25T18:40:08Z-
dc.date.issued2012-12-01-
dc.identifierhttp://dx.doi.org/10.1149/1.4704931-
dc.identifier.citationECS Transactions, v. 43, n. 1, p. 3-7, 2012.-
dc.identifier.issn1938-5862-
dc.identifier.issn1938-6737-
dc.identifier.urihttp://hdl.handle.net/11449/73842-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/73842-
dc.description.abstractThis work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane flints deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. ©The Electrochemical Society.en
dc.format.extent3-7-
dc.language.isoeng-
dc.sourceScopus-
dc.subjectCopper surface-
dc.subjectDip-coating process-
dc.subjectLow concentrations-
dc.subjectOpen circuit potential-
dc.subjectPolarization curves-
dc.subjectSubstrate degradation-
dc.subjectCopper-
dc.subjectDegradation-
dc.subjectElectrochemical impedance spectroscopy-
dc.subjectElectrochemistry-
dc.subjectSilicon compounds-
dc.subjectSilicones-
dc.subjectCoatings-
dc.titleStudy of the influence of the rare earth elements (Ce3+ and Ce4+) concentration on the siloxanes coating applied on the copper surfaceen
dc.typeoutro-
dc.contributor.institutionUniversidade Federal da Grande Dourados (UFGD)-
dc.contributor.institutionUniversidade de São Paulo (USP)-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationFaculdade de Ciências Exatas e Tecnologia UFGD, Dourados, MS-
dc.description.affiliationDepartamento de Engenharia Química Escola Politécnica USP, São Paulo, SP-
dc.description.affiliationDepartamento de Físico-Química Instituto de Química UNESP, Araraquara, SP-
dc.description.affiliationUnespDepartamento de Físico-Química Instituto de Química UNESP, Araraquara, SP-
dc.identifier.doi10.1149/1.4704931-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofECS Transactions-
dc.identifier.scopus2-s2.0-84879436516-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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