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http://acervodigital.unesp.br/handle/11449/76933
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DC Field | Value | Language |
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dc.contributor.author | Sequinel, T. | - |
dc.contributor.author | Garcia, I. G. | - |
dc.contributor.author | Tebcherani, S. M. | - |
dc.contributor.author | Kubaski, E. T. | - |
dc.contributor.author | Oliveira, L. H. | - |
dc.contributor.author | Siu Li, M. | - |
dc.contributor.author | Longo, Elson | - |
dc.contributor.author | Varela, José Arana | - |
dc.date.accessioned | 2014-05-27T11:30:53Z | - |
dc.date.accessioned | 2016-10-25T18:55:10Z | - |
dc.date.available | 2014-05-27T11:30:53Z | - |
dc.date.available | 2016-10-25T18:55:10Z | - |
dc.date.issued | 2014-01-01 | - |
dc.identifier | http://dx.doi.org/10.1016/j.jallcom.2013.08.210 | - |
dc.identifier.citation | Journal of Alloys and Compounds, v. 583, p. 488-491. | - |
dc.identifier.issn | 0925-8388 | - |
dc.identifier.uri | http://hdl.handle.net/11449/76933 | - |
dc.identifier.uri | http://acervodigital.unesp.br/handle/11449/76933 | - |
dc.description.abstract | CCTO thin films were deposited on Pt(1 1 1)/Ti/SiO2/Si substrates using a chemical (polymeric precursor) and pressure method. Pressure effects on CCTO thin films were evaluated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM) and optical properties which revealed that a pressure film (PF) is denser and more homogeneous than a chemical film (CF). Pressure also causes a decrease in the band gap and an increase in the photoluminescence (PL) emission of CCTO films which suggests that the pressure facilitates the displacement of Ti in the titanate clusters and the charge transference from TiO6 to [TiO5V0z], [TiO5V0z] to [CaO11V0z] and [TiO5V0z] to [CuO4]x. © 2013 Elsevier B.V. All rights reserved. | en |
dc.format.extent | 488-491 | - |
dc.language.iso | eng | - |
dc.source | Scopus | - |
dc.subject | CCTO | - |
dc.subject | Photoluminescence | - |
dc.subject | Pressure method | - |
dc.subject | Thin films | - |
dc.title | Red shift and higher photoluminescence emission of CCTO thin films undergoing pressure treatment | en |
dc.type | outro | - |
dc.contributor.institution | Universidade Estadual Paulista (UNESP) | - |
dc.contributor.institution | UTFPR | - |
dc.contributor.institution | Itajara Minérios Ltda. | - |
dc.contributor.institution | Universidade de São Paulo (USP) | - |
dc.contributor.institution | State University of Ponta Grossa | - |
dc.description.affiliation | Instituto de Química UNESP, Rua Prof. Francisco Degni 55, 14800-900 Araraquara, SP | - |
dc.description.affiliation | Departamento de Engenharia de Produção UTFPR, Av. Monteiro Lobato, s/n - Km 04, 84016-210 Ponta Grossa, PR | - |
dc.description.affiliation | Itajara Minérios Ltda., Rua Balduíno Taques 170, 84010-050 Ponta Grossa, PR | - |
dc.description.affiliation | Instituto de Física USP, Av. Trabalhador são-carlense, 400, 13566-590 São Carlos, SP | - |
dc.description.affiliation | State University of Ponta Grossa, Av. General Carlos Cavalcanti 4748, 84030-900 Ponta Grossa, PR | - |
dc.description.affiliationUnesp | Instituto de Química UNESP, Rua Prof. Francisco Degni 55, 14800-900 Araraquara, SP | - |
dc.identifier.doi | 10.1016/j.jallcom.2013.08.210 | - |
dc.identifier.wos | WOS:000326035200083 | - |
dc.rights.accessRights | Acesso restrito | - |
dc.relation.ispartof | Journal of Alloys and Compounds | - |
dc.identifier.scopus | 2-s2.0-84884510764 | - |
Appears in Collections: | Artigos, TCCs, Teses e Dissertações da Unesp |
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