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dc.contributor.authorCalvacanti de Queiroz, Jose Renato-
dc.contributor.authorDuarte, Diego Alexandre-
dc.contributor.authorde Assuncao e Souza, Rodrigo Othavio-
dc.contributor.authorFissmer, Sara Fernanda-
dc.contributor.authorMassi, Marcos-
dc.contributor.authorBottino, Marco Antonio-
dc.identifier.citationMaterials Research-ibero-american Journal of Materials. São Carlos: Universidade Federal de São Carlos (UFSCar), Dept Engenharia Materials, v. 14, n. 2, p. 212-216, 2011.-
dc.description.abstractIn this paper SiOx thin films were deposited on Y-TZP ceramics by reactive magnetron sputtering technique in order to improve the adhesion properties between Y-TZP and resin cement for applications in dental prosthesis. For fixed cathode voltage, target current, working pressure and target-to-substrate distance, SiOx thin films were deposited at different oxygen concentrations in the Ar+O-2 plasma forming gas. After deposition processes, SiOx thin films were characterized by profilometry, energy dispersive spectroscopy (EDS), optical microscopy and scanning electron microscopy (SEM). Adhesion properties between Y-TZP and resin cement were evaluated by shear testing. Results indicate that films deposited at 20%O-2 increased the bond strength to (32.8 +/- 5.4) MPa. This value has not been achieved by traditional methods.en
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)-
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)-
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)-
dc.publisherUniversidade Federal de São Carlos (UFSCar), Dept Engenharia Materials-
dc.sourceWeb of Science-
dc.subjectdental materialen
dc.subjectthin filmsen
dc.subjectsilicon oxideen
dc.titleDeposition of SiOx Thin Films on Y-TZP by Reactive Magnetron Sputtering: Influence of Plasma Parameters on the Adhesion Properties Between Y-TZP and Resin Cement for Application in Dental Prosthesisen
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionInstituto Tecnológico de Aeronáutica (ITA)-
dc.contributor.institutionUniversidade Federal da Paraíba (UFPB)-
dc.description.affiliationSão Paulo State Univ UNESP, Sch Dent, BR-12245000 Sao Jose Dos Campos, SP, Brazil-
dc.description.affiliationTechnol Inst Aeronaut ITA, Plasma Sci & Technol Lab, BR-12228900 Sao Jose Dos Campos, SP, Brazil-
dc.description.affiliationFed Univ Paraiba UFPB, Dept Restorat Dent, BR-58039080 Joao Pessoa, Paraiba, Brazil-
dc.description.affiliationUnespSão Paulo State Univ UNESP, Sch Dent, BR-12245000 Sao Jose Dos Campos, SP, Brazil-
dc.rights.accessRightsAcesso aberto-
dc.relation.ispartofMaterials Research-ibero-american Journal of Materials-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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