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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/25382
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dc.contributor.authorSimoes, A. Z.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorCavalcante, L. S.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.contributor.authorMizaikoff, B.-
dc.date.accessioned2014-05-20T14:17:56Z-
dc.date.accessioned2016-10-25T17:40:14Z-
dc.date.available2014-05-20T14:17:56Z-
dc.date.available2016-10-25T17:40:14Z-
dc.date.issued2007-08-01-
dc.identifierhttp://dx.doi.org/10.1016/j.actamat.2007.04.030-
dc.identifier.citationActa Materialia. Oxford: Pergamon-Elsevier B.V., v. 55, n. 14, p. 4707-4712, 2007.-
dc.identifier.issn1359-6454-
dc.identifier.urihttp://hdl.handle.net/11449/25382-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/25382-
dc.description.abstractCaBi2Nb2O9 (CBNO) thin films were deposited on platinum-coated silicon substrates by the polymeric precursor method, and were annealed in air and in an oxygen atmosphere. The structure, surface morphology and electrical properties of CBNO thin films have been investigated. The presence of an oxygen atmosphere during crystallization of the films affected the structure perfection and morphology, as well as ferroelectric and piezoelectric properties. A reduction in P-r and piezoelectric coefficient, an increase of V-c and displacement of the Curie point is evident in the films crystallized in an oxygen atmosphere. The impact of exposure to the oxygen atmosphere on the creation of defects caused by bismuth and oxygen vacancies between layers was also investigated by X-ray photoelectron spectroscopy. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.en
dc.format.extent4707-4712-
dc.language.isoeng-
dc.publisherElsevier B.V.-
dc.sourceWeb of Science-
dc.subjectpiezoelectricitypt
dc.subjectvacanciespt
dc.subjectpoint defectspt
dc.subjectCaBi2Nb2O9pt
dc.subjectx-ray photoelectron spectroscopypt
dc.titleImpact of oxygen atmosphere on piezoelectric properties of CaBi2Nb2O9 thin filmsen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.contributor.institutionGeorgia Inst Technol-
dc.description.affiliationUniv Estadual Paulista, Inst Quim, Dept Fisico Quim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.description.affiliationUniv Fed Sao Carlos, Dept Quim, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 Sao Carlos, SP, Brazil-
dc.description.affiliationGeorgia Inst Technol, Sch Chem & Biochem, Atlanta, GA 30332 USA-
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, Dept Fisico Quim, Lab Interdisciplinar Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.actamat.2007.04.030-
dc.identifier.wosWOS:000248823200012-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofActa Materialia-
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