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dc.contributor.authorSimões, Alexandre Zirpoli-
dc.contributor.authorPianno, R. F.-
dc.contributor.authorAguiar, E. C.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T14:18:46Z-
dc.date.accessioned2016-10-25T17:40:44Z-
dc.date.available2014-05-20T14:18:46Z-
dc.date.available2016-10-25T17:40:44Z-
dc.date.issued2009-06-24-
dc.identifierhttp://dx.doi.org/10.1016/j.jallcom.2009.01.074-
dc.identifier.citationJournal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 479, n. 1-2, p. 274-279, 2009.-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://hdl.handle.net/11449/25668-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/25668-
dc.description.abstractPure BiFeO3 (BFO) and Nb-doped (BFN) thin films were fabricated by the soft chemical method. The films were polycrystalline when deposited on Pt/Ti/SiO2/Si substrate and annealed at 500 degrees C for 2 h. X-ray diffraction analysis revealed that the film was fully crystallized. The grain size decreased in the BFN films due the suppression of oxygen vacancy concentration in the BFO lattice. The Nb dopant is effective in improving electrical properties of BFO films. With increase niobium content we obtained thin films free of fatigue up to 10(8) cycles. (C) 2009 Published by Elsevier B.V.en
dc.description.sponsorshipCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)-
dc.description.sponsorshipFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)-
dc.description.sponsorshipConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)-
dc.format.extent274-279-
dc.language.isoeng-
dc.publisherElsevier B.V. Sa-
dc.sourceWeb of Science-
dc.subjectFerroelectricsen
dc.subjectThin filmsen
dc.subjectChemical synthesisen
dc.subjectX-ray diffractionen
dc.subjectTransmission electron microscopyen
dc.titleEffect of niobium dopant on fatigue characteristics of BiFeO3 thin films grown on Pt electrodesen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUNESP, Inst Chem, Dept Chem Phys, BR-14800900 Araraquara, SP, Brazil-
dc.description.affiliationUnespUNESP, Inst Chem, Dept Chem Phys, BR-14800900 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.jallcom.2009.01.074-
dc.identifier.wosWOS:000267063300069-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofJournal of Alloys and Compounds-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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