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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/42256
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dc.contributor.authorSimões, Alexandre Zirpoli-
dc.contributor.authorPianno, R. F.-
dc.contributor.authorRiccardi, C. S.-
dc.contributor.authorCavalcante, L. S.-
dc.contributor.authorLongo, Elson-
dc.contributor.authorVarela, José Arana-
dc.date.accessioned2014-05-20T15:33:42Z-
dc.date.accessioned2016-10-25T18:10:22Z-
dc.date.available2014-05-20T15:33:42Z-
dc.date.available2016-10-25T18:10:22Z-
dc.date.issued2008-04-24-
dc.identifierhttp://dx.doi.org/10.1016/j.jallcom.2006.12.066-
dc.identifier.citationJournal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 454, n. 1-2, p. 66-71, 2008.-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://hdl.handle.net/11449/42256-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/42256-
dc.description.abstractWe investigated the dielectric properties of pure and lanthanum modified bismuth titanate thin films obtained by the polymeric precursor method. X-ray diffraction of the film annealed at 300 degrees C for 2h indicates a disordered structure. Lanthanum addition increases gradually the dielectric permittivity of films, keeping unchanged their loss tangent. From C-V curve we can see no hysteresis behavior indicating the absence of domain structure. The decrease in the conductivity for the heavily doped Bi4Ti3O12 (BIT) must be associated to the unidentified crystal defects. For comparison, dielectric properties of crystalline BIT film were also investigated. (C) 2007 Published by Elsevier B.V.en
dc.format.extent66-71-
dc.language.isoeng-
dc.publisherElsevier B.V. Sa-
dc.sourceWeb of Science-
dc.subjectthin filmsen
dc.subjectchemical synthesisen
dc.subjectdielectric responseen
dc.subjectdisordered structureen
dc.titleDielectric properties of pure and lanthanum modified bismuth titanate thin filmsen
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.contributor.institutionUniversidade Federal de São Carlos (UFSCar)-
dc.description.affiliationUniv Estadual Paulista, Inst Quim, Dept Fisico Quim, Lab Interdisciplinar & Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.description.affiliationUniversidade Federal de São Carlos (UFSCar), Dept Quim, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 São Carlos, SP, Brazil-
dc.description.affiliationUnespUniv Estadual Paulista, Inst Quim, Dept Fisico Quim, Lab Interdisciplinar & Ceram, BR-14801907 Araraquara, SP, Brazil-
dc.identifier.doi10.1016/j.jallcom.2006.12.066-
dc.identifier.wosWOS:000255215000015-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofJournal of Alloys and Compounds-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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