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Please use this identifier to cite or link to this item: http://acervodigital.unesp.br/handle/11449/37920
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dc.contributor.authorSantana, R. G.-
dc.contributor.authorHonda, R. Y.-
dc.contributor.authorAlgatti, M. A.-
dc.contributor.authorKayama, M. E.-
dc.contributor.authorMota, Rogério Pinto-
dc.date.accessioned2014-05-20T15:28:01Z-
dc.date.accessioned2016-10-25T18:03:00Z-
dc.date.available2014-05-20T15:28:01Z-
dc.date.available2016-10-25T18:03:00Z-
dc.date.issued1997-04-13-
dc.identifier.citationAbstracts of Papers of the American Chemical Society. Washington: Amer Chemical Soc, v. 213, p. 456-POLY, 1997.-
dc.identifier.issn0065-7727-
dc.identifier.urihttp://hdl.handle.net/11449/37920-
dc.identifier.urihttp://acervodigital.unesp.br/handle/11449/37920-
dc.format.extent456-POLY-
dc.language.isoeng-
dc.publisherAmer Chemical Soc-
dc.sourceWeb of Science-
dc.titleDeposition and etching of HMDSO/SF6 plasma polymerized thin films.en
dc.typeoutro-
dc.contributor.institutionUniversidade Estadual Paulista (UNESP)-
dc.description.affiliationUNIV ESTADUAL PAULISTA,BR-12500000 GUARATINGUETA,SP,BRAZIL-
dc.description.affiliationUnespUNIV ESTADUAL PAULISTA,BR-12500000 GUARATINGUETA,SP,BRAZIL-
dc.identifier.wosWOS:A1997WP18703193-
dc.rights.accessRightsAcesso restrito-
dc.relation.ispartofAbstracts of Papers of the American Chemical Society-
Appears in Collections:Artigos, TCCs, Teses e Dissertações da Unesp

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